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Surface Analysis - Innovations and Solutions for Industry

Thursday 12th October

PROGRAMME

09.00 Registration opens in the atrium  
10.00 Introduction and welcome:  
SESSION 1 | Chair: Mark Baker  
10.10 KEYNOTE SPEAKER
Standards in surface chemical analysis
Charles Clifford, National Physical Laboratory, UK

The use of surface analysis is increasing rapidly and, for many techniques, is now a routine activity carried out by analysts without a detailed understanding of the methods or their limitations. New methods are continually being developed and there is a need to establish the validity, reproducibility and accuracy of their results. There is a consequent need for standards: reference procedures, reference data, and reference materials to enable the results to be accurate, comparable and interpretable. This talk describes the activities, outputs and future directions of ISO technical committee TC201 “surface chemical analysis” and the associated Surface Chemical Analysis Technical Working Area, TWA2, of the Versailles Project on Advanced Materials and Standards (VAMAS).

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10.50 Surface analysis in the nuclear industry
Dr Paul Roussel, AWE, UK

Surface analysis is routinely undertaken of many types of materials including
samples that are radioactive such as those found in the nuclear industry. The
requirement to contain these radioactive and highly toxic materials means
conventional surface science spectrometers have to be modified in some
form. This presentation will cover a brief introduction into plutonium science
followed by the common methods to convert surface science spectrometers to contain radioactive materials and the methods used to undertake
maintenance of these spectrometers. Finally, recent examples of surface
science measurements on plutonium will be presented.

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11.10 Latest Developments in 2D and 3D TOF-SIMS Analysis
Matthias Kleine-Boymann, ION-TOF GmbH , Germany
11.30 - break -  
11.50 ToF-SIMS and industrial applications
Dr David Scurr, University of Nottingham, UK

The application of time of flight secondary ion mass spectrometry (ToF-SIMS) has become widespread within both the academic and commercial community over the last few decades spanning subject areas such as materials science, pharmaceutics, physics, chemistry and semi-conductor research amongst others. This work focuses upon examples of the industrial application of ToF-SIMS analysis within the pharmaceutical and engineering sectors. Specifically, the application of ToF-SIMS has enabled the assessments of drug permeation within skin, characterisation of drug delivery systems, contaminant identification in the manufacturing of textiles and in the chemical characterisation of internal diesel injector deposits (IDID). In each of these areas, ToF-SIMS has enabled research providing improved fundamental scientific understanding and / or has initiated changes in commercial practice.

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12.10

XPS for surface and thin film characterisation
Dr Chris Blomfield, Kratos Analytical Ltd, UK

Surface characterisation by XPS is a standard technique for the quantitative chemical analysis of modified surfaces and thin films. Advances in instrumentation have lead to developments in more advanced areas such as routine imaging XPS of surface heterogeneity which may be combined with small area feature analysis and the characterisation sub-10nm films by ARXPS. Recent developments in ion gun technology has lead to improvements in depth profiling through a wide range of samples such as thick polymeric structures, metal oxides and inorganic superlattice materials. This presentation will provide an overview of the state of the art in laboratory XPS as well as illustrating recent developments in thin film depth profile analysis with the Ar cluster ion source.

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SESSION 2: In the exhibition hall:  
12.30 Lunch Break | POSTER SESSION
A poster prize will be awarded at 13.30 for the best poster.
 
13.35 Networking | Exhibition Session
Delegates are encouraged to visit the Vacuum Expo exhibitors.
 
SESSION 3 | Chair: Alex Shard  
14.10 KEYNOTE SPEAKER
Near-ambient pressure instrumentation: New directions for Surface Analysis with XPS and related core-level spectroscopies
Prof Sven Schroeder, University of Leeds, UK
14.40 Vibrational sum-frequency spectroscopy applied to corrosion inhibition.
Dr Andrew Thomas, University of Manchester, UK

Vibrational sum-frequency spectroscopy is a non-linear optical spectroscopy techniques, which is inherently surface sensitive. This means it can be used for the study of any interface so long as one of them is transparent to both visible and infrared light. Recently we have been applying vibrational sum-frequency spectroscopy to the study of corrosion inhibitors in situ. this talk will discuss preliminary results and future projects planned for the instrument.

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15.00

A measured approach to organic surfaces

Dr Alex Shard, National Physical Laboratory, UK

XPS and SIMS are both powerful analytical tools which provide detailed information about surfaces. In contrast to many other methods, they are relatively benign to delicate samples, such as organic materials and coatings. With the advent of cluster ion beams, their applicability to devices which incorporate such coatings has increased enormously. This talk will cover some of the capabilities of these techniques applied to samples such as layered organic materials typical of organic LED and PV devices, nanoparticles with organic coatings and self-assembled monolayers for biolomolecule detection. It will highlight some of the metrological developments made by the National Physical Laboratory to assist surface analysts in making accurate and useful measurements.

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15.20 Argon cluster XPS depth profiling of metal oxide thin films
Dr Mark Baker, University of Surrey, UK

"In XPS analysis, monatomic argon ion sputtering has been the standard method for cleaning the surface and depth profiling through thin films to determine their chemical composition for over 40 years. However, monatomic ion sputtering causes chemical damage and important chemical information on the material can be lost.  Recent developments have led to XPS instruments being delivered with ion guns able to bombard the surface with argon cluster ions in addition to high energy monatomic argon ions. The argon cluster ions have shown good capabilities in improving the quality of depth profiles through polymeric materials, but inorganic materials are only now being investigated. In this talk, I will describe the gas cluster ion beam source, interaction of the clusters with the surface and show some examples of argon gas cluster ion beam XPS depth profiles through technologically important metal oxide thin films The improvements these new sources can offer through reducing chemical damage will be highlighted." 

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15.40 Meeting materials challenges with correlative analysis
Dr Adam Bushell, Thermo Fisher Scientific, UK

Thanks to an increased level of automation in recent years, X-ray Photoelectron Spectroscopy (XPS) is now being used widely to answer surface analysis problems and drive development of new materials around the world. However, in many cases XPS alone cannot yield a full picture of the sample, and additional analytical measurements, e.g. Monatomic/Cluster Argon ion Depth Profiling or Ultra-Violet Photo-electron Spectroscopy (UPS), are required to confirm or supplement the information gained from XPS. Where additional analytical techniques are required, the optimum solution is to have these techniques readily available, to eliminate variations in sample condition or measurement position. This talk will introduce some examples of additional analytical techniques and their use within a single work flow to gain additional information with confidence.

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16.00 Networking session.  
16:30 End of meeting.  

 


The 2017 Conference and Industry Programme, run by Enlighten Meetings with its partners, covers application and technology advances, innovations and emerging technologies.

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ADVISORY PANEL:

Dr Mark Baker (Chair)
Reader in Surface Science & Engineering, University of Surrey

Dr Alex Shard
Principal Rsearch Scientist, Surface and NanoAnalysis, National Physical Laboratory

Ian Owen
Scanwel Ltd

 

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